Handbook of Crystal Growth

Govindhan Dhanaraj, Kullaiah Byrappa, Vishwanath Prasad, Michael Dudley, "Handbook of Crystal Growth"
Sp..ger | 2010 | ISBN: 3540741828 | 1816 pages | File type: PDF | 202 mb

The Handbook of Crystal Growth brings together the science and technology of growing crystals, defect characterization and techniques, and understanding the defect formation including defects modelling. This unique effort will provide users with fundamental understanding of crystal growth and defects with the latest instrumentation/ techniques available both for crystal fabrication and defects. Understanding in this rapidly advancing field deals with three main areas: Crystal growth and defect formation, growth methods, and various techniques used in characterization.

* Provides the reader with the most complete state-of-the-art presentation on the basics and realization of crystal growth
* Covers the major developments in crystal growth
* Summarizes the most recent knowledge on theory and experimental realization of crystal growth
* World-class contributing authors
* Offers many insights and practical hints for crystal growth researchers and engineers

Over the years, many successful attempts have been made to describe the art and science of crystal growth. Most modern advances in semiconductor and optical devices would not have been possible without the development of many elemental, binary, ternary, and other compound crystals of varying properties and large sizes. The objective of the Springer Handbook of Crystal Growth is to present state-of-the-art knowledge of both bulk and thin-film crystal growth. The goal is to make readers understand the basics of the commonly employed growth processes, materials produced, and defects generated.

Almost 100 leading scientists, researchers, and engineers from 22 different countries from academia and industry have been selected to write chapters on the topics of their expertise. They have written 52 chapters on the fundamentals of bulk crystal growth from the melt, solution, and vapor, epitaxial growth, modeling of growth processes and defects, techniques of defect characterization as well as some contemporary special topics. This unique effort will provide readers with a fundamental understanding of crystal growth with the latest instrumentation and techniques available for crystal and thin-film fabrication.
It is written and compiled for professionals and practitioners, materials scientists, physicists, and chemists at universities and in industrial research and production.



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